Qualitative method for troubleshooting a dielectric tool
作者： Andreja Kontic
DOI:
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摘要: According to one embodiment of the present invention, a method for determining location contaminants on semiconductor wafer comprises obtaining first particle count wafer, scrubbing second after and particles based counts. another source in processing tool steps with at least film deposited thereon, localizing areas where contamination originates from.
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