Method for using an in situ particle sensor for monitoring particle performance in plasma deposition processes

摘要: Methods are provided for identifying root causes of particle issues and developing particle-robust process recipes in plasma deposition processes. The presence situ particles within the substrate processing system is detected over a period time that spans multiple distinct steps recipe. dependence levels determined from these results. Then, correlated with to identify relative steps. This information provides direct indication which result production contaminants so those may be targeted modification development recipes.