Shower head structure and treating device

作者: Kenji Matsumoto

DOI:

关键词:

摘要: A shower head structure characterized by comprising a section, opposed to the upper surface of mounting table in an evacuable treating vessel, for injecting processing gas into vessel; temperature observation through-hole which opens lower so as be table, transparent window hermetically seals end through-hole, radiation thermometer disposed on window, adhesion preventive supply path communicating with prevent film from adhering wherein communicates through injection nozzle window.

参考文章(7)
Hiroshi Kanekiyo, Hiromichi Enami, Tatehito Usui, Kazue Takahashi, Hideyuki Yamamoto, Mitsuru Suehiro, Toshio Masuda, Plasma processing system and apparatus and a sample processing method ,(2003)
隆之 大場, Takayuki Oba, Semiconductor production device ,(1991)
Sakuma Takeshi, Kato Yuji, Takagi Toshio, Matsumoto Kenji, SHOWERHEAD STRUCTURE, PROCESSING APPARATUS, AND PROCESSING METHOD ,(2004)
Fujii Takuya, Egawa Mitsuru, EPITAXIAL GROWTH EQUIPMENT ,(1999)
Iwata Koutei, Komiyama Kichizou, Matsunaga Jiyuuji, Miyazaki Yoshihiko, SEMICONDUCTOR VAPOR GROWTH DEVICE ,(1983)