How is the chemical bonding of W-Si-N sputtered coatings?

摘要: Abstract Thin films of W–Si–N, deposited by reactive magnetron sputtering, were investigated using X-ray photoelectron spectroscopy (XPS). The objective this research work was to study the chemical binding state these coatings. During sputtering process, established atomic bonds may possibly not agree elemental bonding preview values affinity, which decrease for SiN, SiW WN bonds. XPS data show that in W-based have simultaneous additions Si and N, a SiN type is preferential bond established. This behaviour confirmed either evolution Si/W ratio as-deposited coatings, increase with N content, or variation lattice parameters b.c.c. α-W phase W–N, W–Si W–Si–N systems. However, since no compound silicon nitride detected, it concluded phase, formed specific contents must been present amorphous state.