Evaluation of amorphous (Mo, Ta, W)SiN diffusion barriers for 〈Si〉|Cu metallizations
作者： J.S. Reid , E. Kolawa , R.P. Ruiz , M.-A. Nicolet
DOI: 10.1016/0040-6090(93)90689-M
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摘要: … , namely, amorphous binary metal silicides, M(=Mo, Ta or W)-Si, and amorphous ternary MSi-… Secondly, the lack of grain boundaries in an amorphous structure eliminates fast diffusion …
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