Thermal stability of magnetron sputtered Zr–Si–N films
作者： R. Daniel , J. Musil , P. Zeman , C. Mitterer
DOI: 10.1016/J.SURFCOAT.2006.07.206
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摘要: … Therefore, the main aim of this article is the investigation of the thermal stability of the Zr–Si–N films and particularly factors which determine the crystallization temperature of the X-ray …
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J. Musil, P. Dohnal, P. Zeman, Physical properties and high-temperature oxidation resistance of sputtered Si3N4∕MoNx nanocomposite coatings Journal of Vacuum Science & Technology B. ,vol. 23, pp. 1568- 1575 ,(2005) , 10.1116/1.1947798
P. Rogl, J. C. Schuster, Phase diagrams of ternary boron nitride and silicon nitride systems ASM International. ,(1992)
F.M. D'Heurle, J.M.E. Harper, Note on the origin of intrinsic stresses in films deposited via evaporation and sputtering Thin Solid Films. ,vol. 171, pp. 81- 92 ,(1989) , 10.1016/0040-6090(89)90035-7
C. Louro, A. Cavaleiro, Mechanical behaviour of amorphous W–Si–N sputtered films after thermal annealing at increasing temperatures Surface and Coatings Technology. ,vol. 123, pp. 192- 198 ,(2000) , 10.1016/S0257-8972(99)00533-2
H.M Benia, M Guemmaz, G Schmerber, A Mosser, J.-C Parlebas, Investigations on non-stoichiometric zirconium nitrides Applied Surface Science. ,vol. 200, pp. 231- 238 ,(2002) , 10.1016/S0169-4332(02)00925-X
P. Panjan, B. Navinšek, A. Cvelbar, A. Zalar, I. Milošev, Oxidation of TiN, ZrN, TiZrN, CrN, TiCrN and TiN/CrN multilayer hard coatings reactively sputtered at low temperature Thin Solid Films. pp. 298- 301 ,(1996) , 10.1016/0040-6090(96)08663-4
M Diserens, J Patscheider, F Lévy, Improving the properties of titanium nitride by incorporation of silicon Surface & Coatings Technology. ,vol. 108, pp. 241- 246 ,(1998) , 10.1016/S0257-8972(98)00560-X
P. Zeman, J. Musil, R. Daniel, High-temperature oxidation resistance of Ta-Si-N films with a high Si content Surface & Coatings Technology. ,vol. 200, pp. 4091- 4096 ,(2006) , 10.1016/J.SURFCOAT.2005.02.097
C Louro, A Cavaleiro, F Montemor, How is the chemical bonding of W-Si-N sputtered coatings? Surface & Coatings Technology. ,vol. 142144, pp. 964- 970 ,(2001) , 10.1016/S0257-8972(01)01215-4
J.D. Wilcock, D.S. Campbell, A sensitive bending beam apparatus for measuring the stress in evaporated thin films Thin Solid Films. ,vol. 3, pp. 3- 12 ,(1969) , 10.1016/0040-6090(69)90107-2