Atomic force microscopy study of titanium dioxide thin films grown by atomic layer epitaxy
作者： Mikko Ritala , Markku Leskelä , Leena-Sisko Johansson , Lauri Niinistö
DOI: 10.1016/0040-6090(93)90557-6
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摘要: Abstract Atomic force microscopy was used to study the morphological development of TiO2 thin films deposited on mica and soda-lime substrates by atomic layer epitaxy using TiCl4 water as reactants. observed agglomerate, causing increasing surface roughening with number deposition cycles. The reasons for agglomeration are discussed.
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