Fabrication of self-aligned gated silicon microtip array using electrochemical silicon etching
作者： G. Barillaro , F. D'Angelo , G. Pennelli , F. Pieri
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摘要: In this paper we report a new approach to fabricate gated silicon microtip arrays for field emission applications using single mask process. The key role in the fabrication process is played by photoelectrochemical etching of HF-based electrolytes. This technique here exploited produce highly uniform arrays. detailed and dependence tip geometry on electrochemical parameters discussed.
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