Ferroelectricity of HfZrO 2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors

作者: Min Hung Lee , Y.-T Wei , C. Liu , J.-J Huang , Ming Tang

DOI: 10.1109/JEDS.2015.2435492

关键词:

摘要: The corresponding energy landscape and surface potential are deduced from the experimental ferroelectricity of HfZrO2 (HZO) for low-power steep-slope transistor applications. anti-ferroelectric (AFE) in annealed 600°C HZO extracted electrostatic gain measured polarization hysteresis loop calculated subthreshold swing 33 mV/dec over six decades $I_{\rm DS} $ . A feasible concept coupling AFE is experimentally established with validity negative capacitance beneficial FET development future generation.

参考文章(17)
M. H. Lee, J.-C. Lin, Y.-T. Wei, C.-W. Chen, W.-H. Tu, H.-K. Zhuang, M. Tang, Ferroelectric negative capacitance hetero-tunnel field-effect-transistors with internal voltage amplification international electron devices meeting. ,(2013) , 10.1109/IEDM.2013.6724561
Alexandru Rusu, Giovanni A Salvatore, David Jimenez, Adrian M Ionescu, None, Metal-Ferroelectric-Meta-Oxide-semiconductor field effect transistor with sub-60mV/decade subthreshold swing and internal voltage amplification international electron devices meeting. ,(2010) , 10.1109/IEDM.2010.5703374
Stefan Mueller, Johannes Mueller, Aarti Singh, Stefan Riedel, Jonas Sundqvist, Uwe Schroeder, Thomas Mikolajick, Incipient Ferroelectricity in Al-Doped HfO2 Thin Films Advanced Functional Materials. ,vol. 22, pp. 2412- 2417 ,(2012) , 10.1002/ADFM.201103119
Giovanni A. Salvatore, Didier Bouvet, Adrian Mihai Ionescu, Demonstration of subthrehold swing smaller than 60mV/decade in Fe-FET with P(VDF-TrFE)/SiO 2 gate stack international electron devices meeting. pp. 1- 4 ,(2008) , 10.1109/IEDM.2008.4796642
Sayeef Salahuddin, Supriyo Datta, Use of Negative Capacitance to Provide Voltage Amplification for Low Power Nanoscale Devices Nano Letters. ,vol. 8, pp. 405- 410 ,(2008) , 10.1021/NL071804G
Min Hyuk Park, Han Joon Kim, Yu Jin Kim, Woongkyu Lee, Taehwan Moon, Cheol Seong Hwang, Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature Applied Physics Letters. ,vol. 102, pp. 242905- ,(2013) , 10.1063/1.4811483
Keita Miyasato, Shigeharu Abe, Hideo Takezoe, Atsuo Fukuda, Eiichi Kuze, Direct Method with Triangular Waves for Measuring Spontaneous Polarization in Ferroelectric Liquid Crystals Japanese Journal of Applied Physics. ,vol. 22, ,(1983) , 10.1143/JJAP.22.L661
T. S. Boscke, J. Muller, D. Brauhaus, U. Schroder, U. Bottger, Ferroelectricity in hafnium oxide: CMOS compatible ferroelectric field effect transistors international electron devices meeting. ,(2011) , 10.1109/IEDM.2011.6131606
Chun Hu Cheng, Albert Chin, Low-Voltage Steep Turn-On pMOSFET Using Ferroelectric High- $\kappa$ Gate Dielectric IEEE Electron Device Letters. ,vol. 35, pp. 274- 276 ,(2014) , 10.1109/LED.2013.2291560
J. Müller, U. Schröder, T. S. Böscke, I. Müller, U. Böttger, L. Wilde, J. Sundqvist, M. Lemberger, P. Kücher, T. Mikolajick, L. Frey, Ferroelectricity in yttrium-doped hafnium oxide Journal of Applied Physics. ,vol. 110, pp. 114113- ,(2011) , 10.1063/1.3667205