A coupled approach to thermochemical and mass transport modeling : application to TiSi2 deposition by CVD

摘要: Abstract CVD phase diagrams are used to display solid equilibrium phases as function of temperature, pressure and feed gas composition. This a priori thermodynamic approach provides an assessment the experimental method: determination reactant gases, likely be formed from initial but also by reaction with substrate furnace walls. However, this method is “closed box” approach. The use stream element fractions not expected yield state corresponding actually established at gas/solid interface, where decisive reactions occur. An “open using mass transport modeling within entire reactor coupled thermochemical databases calculations does necessitate, in diffusion-limited regime, knowledge chemical kinetic data true composition gaseous reactants products over which depends on diffusion, thermodiffusion, convection depletion phenomena. For horizontal it possible predict film uniformity, growth rate nature deposit We have shown that “transport-modified” computations should provide more accurate estimates location distribution than conventional because (a) they take into account phenomena (b) reliable for deposition chemistry.