Method of diagnosing malfunctions in semiconductor manufacturing equipment

摘要: Manufacturing modern day integrated circuits requires that each of a long sequence steps perform to tight set specifications. Since equipment malfunctions are inevitable, profitable manufacturing such be rapidly isolated and corrected. This invention describes the use process models for diagnosing semiconductor malfunctions. One method makes multiple second single model at operating points. The fault isolation approaches described herein based on analysis discrepancy between predictions observed outputs. have been evaluated plasma enhanced chemical-vapor deposition silicon nitride, etching nitride.