Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits.
作者： S.V. Sreenivasan
DOI: 10.1038/MICRONANO.2017.75
关键词:
摘要: … This article discusses the transition of a form of nanoimprint lithography technology, known as Jet and Flash Imprint Lithography (J-FIL), from research to a commercial fabrication …
nature.com
sci-hub.se 参考文章(83)
Yang Zhang, CMOS-MEMS Probe Arrays for Tip-Based Nanofabrication ,(2014)
S.V. Sreenivasan, J. Choi, P. Schumaker, F. Xu, Status of UV Imprint Lithography for Nanoscale Manufacturing Comprehensive Nanoscience and Technology. ,vol. 4, pp. 83- 116 ,(2011) , 10.1016/B978-0-12-374396-1.00123-9
Juergen Reich, Christian Wolters, Surface scanning inspection system with independently adjustable scan pitch ,(2014)
U. Dürig, G. Cross, M. Despont, U. Drechsler, W. Häberle, M.I. Lutwyche, H. Rothuizen, R. Stutz, R. Widmer, P. Vettiger, G.K. Binnig, W.P. King, K.E. Goodson, "Millipede" - An AFM data storage system at the frontier of nanotribology Tribology Letters. ,vol. 9, pp. 25- 32 ,(2000) , 10.1023/A:1018844124754
Philip D. Schumaker, Byung-Jin Choi, Pawan Kumar Nimmakayala, Alignment for edge field nano-imprinting ,(2009)
Jared L. Hodge, Philip D. Schumaker, Drop pattern generation for imprint lithography ,(2008)
Byung-Jin Choi, Sidlgata V. Sreenivasan, Method and System for Double-Sided Patterning of Substrates ,(2006)
Sean J. Bentley, Nonlinear interferometric lithography for arbitrary two-dimensional patterns Journal of Micro-nanolithography Mems and Moems. ,vol. 7, pp. 013004- ,(2008) , 10.1117/1.2838591
Cynthia Brooks, Gerard M. Schmid, Mike Miller, Steve Johnson, Niyaz Khusnatdinov, Dwayne LaBrake, Douglas J. Resnick, S. V. Sreenivasan, Step and flash imprint lithography for manufacturing patterned media Proceedings of SPIE. ,vol. 7271, ,(2009) , 10.1117/12.815016
B.J. Choi, S.V. Sreenivasan, S. Johnson, M. Colburn, C.G. Wilson, Design of orientation stages for step and flash imprint lithography Precision Engineering-journal of The International Societies for Precision Engineering and Nanotechnology. ,vol. 25, pp. 192- 199 ,(2001) , 10.1016/S0141-6359(01)00068-X