Low-loss GeO(2) optical waveguide fabrication using low deposition rate rf sputtering.

摘要: Low-loss GeO2 thin-film optical waveguides have been prepared using rf reactive sputtering with a target, and the propagation properties of over wide range fabrication conditions investigated. We found that waveguide attenuation dramatically decreased when very low deposition rate in an argon–oxygen atmosphere was used conjunction appropriate annealing. In particular, 3800-A thick losses <0.7 dB/cm for TE0 mode at wavelength 0.63 μm. The average refractive index films measured to be 1.6059 λ = 5461 A by ellipsometer technique good agreement measurement on bulk materials. Propagation also different wavelengths, which shows could from visible near infrared.