Optimizing null ellipsometry for oxidized silicon.

摘要: Polarizer imperfections which produce a deviation of the measuring light beam cause systematic errors in estimation optical parameters particularly for low absorbing systems such as oxidized silicon. These can be reduced considerably by using polarizer, specimen, compensator, analyzer (PSCA) instead PCSA arrangement. In addition, PSCA measurements made nearer to principal angle where sensitivity is greatest. The discrepancy Δ between zones factor 20. Precision improved 10–50 near compared with at any incidence Results on silicon covered natural oxide are illustration.