作者: T. E. Jackman , J.-M. Baribeau , D. J. Lockwood , P. Aebi , T. Tyliszczak
DOI: 10.1103/PHYSREVB.45.13591
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摘要: The structure of [(Si) m /(Ge) n ] p superlattice interfaces and the onset relaxation interdiffusion initiated by annealing have been investigated with use extended x-ray-absorption fine Raman scattering. For as-grown material, Ge-Ge bond length (0.2409 nm) was equal to that calculated for a fully strained Ge layer (0.2412 while Si-Ge significantly shorter. results show conclusively substantial intermixing along partial bonds occurs even shortest anneal at 700°C