Comprehensive study of a Pd/Al0.24Ga0.76As-based field-effect-transistor-type hydrogen sensor

作者: Yan-Ying Tsai , Kun-Wei Lin , Huey-Ing Chen , Ching-Wen Hung , Tzu-Pin Chen

DOI: 10.1016/J.SNB.2008.01.058

关键词:

摘要: Abstract An interesting Pd/Al 0.24 Ga 0.76 As-based field-effect-transistor-type hydrogen detector is fabricated and studied. The corresponding electronic sensing properties are measured investigated. Based on the results, a model developed. Theoretically, dipolar layer formed by atoms adsorbed at Pd–AlGaAs interface can be considered as two-dimensional layer. Under 980 ppm H 2 /air environment, concentration of adsorption sites available metal–semiconductor interface, n i , effective distance, d from to 9.5 × 10 13  cm −2 3 A, respectively. simulated curves show excellent agreement with experimental results. In addition, an anomalous decrease phenomenon in transient response observed which may caused formation hydroxyl species water.

参考文章(23)
Ingemar Lundström, None, Hydrogen sensitive mos-structures: Part 1: Principles and applications Sensors and Actuators. ,vol. 1, pp. 403- 426 ,(1981) , 10.1016/0250-6874(81)80018-2
D. Filippini, I. Lundström, Hydrogen detection on bare SiO2 between metal gates Journal of Applied Physics. ,vol. 91, pp. 3896- 3903 ,(2002) , 10.1063/1.1450025
Yan-Ying Tsai, Ching-Wen Hung, Ssu-I Fu, Po-Hsien Lai, Huey-Ing Chen, Wen-Chau Liu, On the Hydrogen Sensing Properties of a Pt-Oxide- In0.5Al0.5P Schottky Diode Electrochemical and Solid State Letters. ,vol. 9, ,(2006) , 10.1149/1.2345549
S W Tan, W T Chen, M Y Chu, W S Lour, Sub-0.5-µm gate doped-channel field-effect transistors with HEMT-like channel using thermally reflowed photoresist and spin-on glass Semiconductor Science and Technology. ,vol. 19, pp. 167- 171 ,(2004) , 10.1088/0268-1242/19/2/007
R. C. Hughes, P. A. Taylor, A. J. Ricco, R. R. Rye, Kinetics of Hydrogen Adsorption and Absorption: Catalytic Gate MIS Gas Sensors on Silicon Journal of The Electrochemical Society. ,vol. 136, pp. 2653- 2661 ,(1989) , 10.1149/1.2097536
L‐G Petersson, HM Dannetun, J Fogelberg, Ingemar Lundström, None, Hydrogen adsorption states at the external and internal palladium surfaces of a palladium‐silicon dioxide‐silicon structure Journal of Applied Physics. ,vol. 58, pp. 404- 413 ,(1985) , 10.1063/1.335693
M. Johansson, I. Lundström, L.-G. Ekedahl, BRIDGING THE PRESSURE GAP FOR PALLADIUM METAL-INSULATOR-SEMICONDUCTOR HYDROGEN SENSORS IN OXYGEN CONTAINING ENVIRONMENTS Journal of Applied Physics. ,vol. 84, pp. 44- 51 ,(1998) , 10.1063/1.368000