作者: A Hospodková , M Zíková , J Pangrác , J Oswald , J Kubištová
DOI: 10.1088/0022-3727/46/9/095103
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摘要: The aim of this work is to red shift quantum dot (QD) photoluminescence (PL) towards telecommunication wavelengths by engineering the metalorganic vapour phase epitaxy (MOVPE) prepared structure InAs/GaAs QDs covered a GaAsSb strain-reducing layer. Our results proved that type I or II band alignment can be controlled both composition and QD size. Maintaining heterostructure important for high luminescence efficiency emission wavelength stability structure. simulation electron in InAs with layer as well experimental suggest importance increasing size obtaining longer PL from heterostructure. maximum 1371 nm was achieved MOVPE 14% Sb GaAsSb. This exhibits seven times higher intensity, twice narrower peak 85 meV redshift comparison similarly GaAs.