Vacuum processing apparatus
作者： 竜大 田口 , Tatsuhiro Taguchi
DOI:
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摘要: PROBLEM TO BE SOLVED: To simplify substrate transfer processes of a vacuum processing apparatus. SOLUTION: The apparatus 10 has loading/unloading chamber 11, preliminarily heating 12, and 13. In the there are provided forward 22, backward 32, heater H for W. one is on side 22. Forward apparatuses 21, 22 W, 31, 32 processed-off 11 capable switching atmospheric releasing to vacuous sealing, vice versa, W so inputted from as be recovered by via operations x2-x5. COPYRIGHT: (C)2006,JPO&NCIPI
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