Interfacial reactions and thermal stability of ultrahigh vacuum deposited multilayered Mo/Si structures
作者： J. M. Liang , L. J. Chen
DOI: 10.1063/1.361835
关键词:
摘要: Interfacial reactions and thermal stability of ultrahigh vacuum deposited multilayered Mo/Si structures have been investigated by high resolution transmission electron microscopy in conjunction with fast Fourier transform autocorrelation function analysis. For samples nominal atomic ratios Mo:Si=1:2 3:1, well defined were obtained after annealing at 250 °C for 30 min. On the other hand, distinct MoSi2/Si structure was formed only 650 °C 1 h. Multiphases observed to simultaneously form annealed 400–500 °C. After 600 °C h, tetragonal MoSi2 silicide phase samples, whereas both hexagonal present Mo:Si‐3:1 samples. The found depend critically on constituent elements, bilayer period, conditions. results are interpreted terms delicate balance among intermixing atoms, formation, crystallization silicon.
scitation.org
harvard.edu
aip.org
sci-hub.se 参考文章(17)
MARC-A. NICOLET, S.S. LAU, Formation and Characterization of Transition-Metal Silicides VLSI Electronics Microstructure Science. ,vol. 6, pp. 329- 464 ,(1983) , 10.1016/B978-0-12-234106-9.50011-8
Norman G. Einspruch, Graydon B. Larrabee, Materials and Process Characterization ,(2014)
E. Ziegler, Y. Lepetre, Ivan K. Schuller, E. Spiller, Stability of multilayers for synchrotron optics Applied Physics Letters. ,vol. 48, pp. 1354- 1356 ,(1986) , 10.1063/1.96907
J. M. Liang, L. J. Chen, Autocorrelation function analysis of phase formation in the initial stage of interfacial reactions of molybdenum thin films on (111)Si Applied Physics Letters. ,vol. 64, pp. 1224- 1226 ,(1994) , 10.1063/1.110846
Hideo Nakajima, Hiroyasu Fujimori, Masahiro Koiwa, Interdiffusion and structural relaxation in Mo/Si multilayer films Journal of Applied Physics. ,vol. 63, pp. 1046- 1051 ,(1988) , 10.1063/1.340005
Zuimin Jiang, Xiaoming Jiang, Wenhan Liu, Ziqin Wu, Thermal stability of multilayer films Pt/Si, W/Si, Mo/Si, and W/C Journal of Applied Physics. ,vol. 65, pp. 196- 200 ,(1989) , 10.1063/1.342569
W.G. Sloof, O.B. Loopstra, Th.H. de Keijser, E.J. Mittemeijer, Diffusion and structural relaxation in amorphous Mo/Si multilayers Scripta Metallurgica. ,vol. 20, pp. 1683- 1687 ,(1986) , 10.1016/0036-9748(86)90269-3
Troy W. Barbee, Stanley Mrowka, Michael C. Hettrick, Molybdenum-silicon multilayer mirrors for the extreme ultraviolet. Applied Optics. ,vol. 24, pp. 883- 886 ,(1985) , 10.1364/AO.24.000883
D. G. Stearns, The scattering of x rays from nonideal multilayer structures Journal of Applied Physics. ,vol. 65, pp. 491- 506 ,(1989) , 10.1063/1.343131
Amanda K. Petford‐Long, Mary Beth Stearns, C.‐H. Chang, S. R. Nutt, D. G. Stearns, N. M. Ceglio, A. M. Hawryluk, High‐resolution electron microscopy study of x‐ray multilayer structures Journal of Applied Physics. ,vol. 61, pp. 1422- 1428 ,(1987) , 10.1063/1.338122