High rate deposition of photocatalytic TiO2 films by dc magnetron sputtering using a TiO2−x target
作者： Yasushi Sato , Akira Uebayashi , Norihiro Ito , Toshihisa Kamiyama , Yuzo Shigesato
DOI: 10.1116/1.2870226
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摘要: Photocatalytic TiO2 films were deposited on glass substrates by dc magnetron sputtering using a slightly reduced TiO2−x target (2−x=1.986; conductivity, 3.7 S cm−1; density, 4.21 g/cm3). The variation in the deposition rate as function of O2 flow ratio did not show hysteresis curve at “transition region” seen case Ti metal target. 100% Ar gas was approximately seven times higher than that an “oxide mode.” postannealed air temperatures ≥200 °C showed excellent photodecomposition characteristics acetaldehyde (CH3CHO) well photoinduced hydrophilicity.
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