Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films
作者： S. Ohno , D. Sato , M. Kon , P.K. Song , M. Yoshikawa
DOI: 10.1016/S0040-6090(03)01152-0
关键词: Materials science 、 Sputter deposition 、 Deposition (law) 、 Sputtering 、 Cavity magnetron 、 Mineralogy 、 Anatase 、 Oxide 、 Analytical chemistry 、 Photocatalysis 、 Titanium dioxide
摘要: Abstract Titanium dioxide (TiO2) films were deposited on unheated non-alkali glass substrates by reactive mid-frequency (mf) magnetron sputtering using dual cathodes with two Ti metal targets. In order to achieve a very high deposition rate, the depositions carried out in ‘transition region’ between metallic and (oxide) sputter mode where target surface was oxidized, respectively. Stable successfully whole transition region at both total pressures of 1 Pa 3 Pa, plasma control unit (PCU). The highest rate this study for photocatalytic TiO2 over 30 nm/min, which larger than that conventional one magnitude. These could be crystallized post-annealing air 200 °C. Photoinduced decomposition acetaldehyde photoinduced hydrophilicity demonstrated.
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