The preparation and characterization of photocatalytically active TiO2 thin films and nanoparticles using Successive-Ionic-Layer-Adsorption-and-Reaction

摘要: Abstract Photocatalytically active TiO 2 thin-films were deposited on silicon wafers using the Successive-Ionic-Layer-Adsorption-and-Reaction technique and subsequent hydrothermal and/or furnace annealing. Atomic-force-microscopy images X-ray diffraction measurements of films obtained under various annealing conditions show how changes micro-scale surface structure depend post-SILAR treatment. The hydrogen evolution over was measured. Hydrothermally treated a higher photocatalytic activity much better mechanical stability compared to furnace-annealed films. optical transmittance thin glass substrates also studied. A red shift observed with increasing film thickness. nanoparticles (∼10 nm) that peeled off from investigated high-resolution-transmission-electron-microscopy.