Controlling refractive index in AlN films by texture and crystallinity manipulation

摘要: Abstract Highly textured polycrystalline aluminum nitride (c-AlN) thin films with hexagonal wurtzite structure have been prepared by direct current reactive magnetron sputtering (DC) of pure using different compositions the gas phase and substrate temperatures. The microstructure investigated x-ray diffraction (XRD) transmission electron microscopy (TEM). In addition, complex refractive index dispersion N − λ = n + jk their thickness determined from normal-incidence transmittance spectra measured in UV visible regions. An increase XRD intensity (002) planes associated nitrogen contents composition has observed. It was found that higher content mixture temperature help to improve preferred orientation coatings along c -axis cell. This is accompanied an ordinary ( 0 ) 1.8 2.1. can be attributed reduction lateral defect density between columns' interfaces highly samples, which line TEM observation shows well aligned columns sample highest index.