Silicon-containing heat- or photo-curable composition
作者： Naofumi Yoshida , Yuji Tashiro
DOI:
关键词:
摘要: A heat- or photo-curable composition comprising: a polysiloxane which is produced by reacting silicon compound (i) represented the formula: R 1 n Si(X) 4-n (wherein represents an alkyl group, aryl group like; X chlorine atom alkoxy group; and 0 to 2) with (ii) formula (b) (c) 2 7 independently represent M arylene alkylene Y 6 group) in presence of alkali catalyst acid catalyst; polymerization initiator enables generation base action heat light; solvent. The formation thick film. When coated onto substrate, then heated exposed light, developed if necessary, cured at low temperature, film can be formed.
wipo.int
lens.org 参考文章(14)
Yugo Tanigaki, Keiichi Uchida, Mitsuhito Suwa, Takenori Fujiwara, Positive photosensitive resin composition, cured film formed from the same, and device having cured film ,(2010)
Yuji Tashiro, Hiroyuki Aoki, Tomonori Ishikawa, Composition for forming etching stopper layer ,(2004)
Jun-chao Huang, Chao-bin He, Yang Xiao, Khine Yi Mya, Jie Dai, Yeen Ping Siow, Polyimide/POSS nanocomposites: interfacial interaction, thermal properties and mechanical properties Polymer. ,vol. 44, pp. 4491- 4499 ,(2003) , 10.1016/S0032-3861(03)00434-8
Hikaru Sugita, Toshiyuki Kai, Nobuji Matsumura, Tsutomu Shimokawa, Daisuke Shimizu, Method of forming pattern and composition for forming of organic thin-film for use therein ,(2007)
Haruaki Hitachi Chemical Co. Ltd. Sakurai, Koichi Hitachi Chemical Co. Ltd. Abe, Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide ,(2004)
SangHak Lim, Shahrokh Motallebi, Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same ,(2007)
Takashi Fuke, Daishi Tokoyama, Toshiaki Nonaka, Yuji Tashiro, Positive-type photosensitive siloxane composition ,(2013)
Kyoyu Yasuda, Satoshi Dei, Fumihiro Toyokawa, Masato Tanaka, Koichi Hasegawa, Keiji Konno, Inverted pattern forming method and resin composition ,(2009)
Tsutomu Ogihara, Takafumi Ueda, Toshiharu Yano, Patterning process and composition for forming silicon-containing film usable therefor ,(2012)