作者: N. A. Cherkashin , N. N. Ledentsov , D. A. Bedarev , M. M. Sobolev , I. V. Kochnev
DOI: 10.1134/1.1187932
关键词:
摘要: A report is presented on the investigation of influence in situ annealing InGaAs layer p-n InGaAs/GaAs structures grown by metalloorganic chemical vapor deposition upon formation coherently strained three-dimensional islands. The were studied methods capacitance-voltage measurements, deep-level transient spectroscopy, transmission electron microscopy, and photoluminescence. It established that islands with misfit dislocations are formed unannealed structure A, while quantum dots annealed B. defects investigated. In various types (EL2, EL3 (I3), I2, HL3, HS2, H5) present electron-accumulation layer. Concentrations these traps comparable to shallow donor concentration, number hole higher than traps. On annealing, EL2 defects, which related dislocations, disappear, concentrations other decrease an order magnitude or more. For it population states controlled defects. B, effect Coulomb interaction charge carriers localized dot ionized observed.