TFT fabrication on leached glass surface
作者： Chad B. Moore
DOI:
关键词:
摘要: A method for forming top gated TFTs directly on a glass surface, wherein the surface is first leached adequately to provide silica-rich boundary area at after which source-drain semiconductor region deposited onto without barrier layer.
google.co.in参考文章(12)
Yoshio Murano, Sakuji Yoshihara, Teruhisa Fujita, Kazuhiko Sekiguchi, Teruki Kitayama, Takeshi Kojima, Method of manufacturing a magnetic recording disk using glass substrate ,(1996)
Kenneth B. Loritsch, Robert D. James, Purified quartz and process for purifying quartz ,(1990)
Andre Hecq, Karel Van Baelen, Camille Dupont, Dealkalized sheet glass ,(1991)
Mamoru Mizuhashi, Yoshio Gotoh, Glass body provided with an alkali diffusion-preventing silicon oxide layer ,(1982)
Andre Hecq, Camille Dupont, Karel V. Baelen, Method of producing dealkalized sheet glass ,(1992)
Kay M. Belscher, Leroy R. Morse, Fumio Okamoto, B. Jean Sterlace, Adhering metal to glass ,(1995)
R.J. Araujo, F.P. Fehlner, Sodium redistribution between oxide phases Journal of Non-Crystalline Solids. ,vol. 197, pp. 154- 163 ,(1996) , 10.1016/0022-3093(95)00632-X
Nang T. Tran, Process for producing a large area solid state radiation detector ,(1992)
Paul A. Sachenik, Francis P. Fehlner, Silicon device production ,(1993)
Hongyong Paresu Miyagami Zhang, Method for crystallising a non-single crystal semiconductor by heating ,(1991)