作者: Bing-Rui Wu , Sin-Liang Ou , Shih-Yung Lo , Hsin-Yuan Mao , Jhen-Yu Yang
DOI: 10.1155/2014/907610
关键词:
摘要: Transparent electrodes of tin dioxide (SnO2) on glasses were further wet-etched in the diluted HCl:Cr solution to obtain larger surface roughness and better light-scattering characteristic for thin-film solar cell applications. The process parameters terms HCl/Cr mixture ratio, etching temperature, time have been investigated. After process, roughness, transmission haze, sheet resistance SnO2 measured. It was found that rate increased with additions etchant concentration Cr temperature. optimum texture-etching 0.15 wt.% 49% HCl, temperature 90°C, 30 sec. Moreover, silicon cells p-i-n structure fabricated textured using hot-wire chemical vapor deposition. By optimizing efficiency from 4.04% 4.39%, resulting increment short-circuit current density 14.14 15.58 mA/cm2. This improvement performances can be ascribed effect induced by texturization SnO2.