Apparatus and method for measuring a property of a layer in a multilayered structure
作者： Ji Ping Li , Peter G. Borden
DOI:
关键词:
摘要: An apparatus measures a property of layer (such as the sheet resistance or thermal conductivity by following method: (1) focusing heating beam on region conductive layer, (2) modulating power at predetermined frequency that is selected to be sufficiently low ensure least majority (preferably all) generated heat transfers out heated diffusion, and (3) measuring another (a) reflected region, (b) modulated in phase with modulation beam. When measurement changes more than amount (e.g. 10 %), fabrication process parameter changed return normal.
google.co.in参考文章(115)
Dostoomian A, Vanzetti R, Infrared non-contact system for inspection of infrared emitting components in a device ,(1972)
Jon Opsal, Allan Rosencwaig, Evaluating both thickness and compositional variables in a thin film sample ,(1984)
Jon Opsal, Allan Rosencwaig, Evaluation of surface and subsurface characteristics of a sample ,(1986)
Jovan Moacanin, Su-don Hong, Amitava Gupta, Double-beam optical method and apparatus for measuring thermal diffusivity and other molecular dynamic processes in utilizing the transient thermal lens effect National Aeronautics and Space Administration Report. ,(1979)
Stuart A. Mills, James Ryan, Robert A. Mitchell, Adaptively aligned optical correlator and method ,(2000)
Satoshi Teramoto, Naoaki Yamaguchi, Koichiro Tanaka, Optical processing apparatus and optical processing method ,(2002)
Allan Rosencwaig, Walter L. Smith, Clifford G. Wells, Apparatus for evaluating thermal and electrical characteristics in a sample ,(1992)
Regina G. Nijmeijer, Peter G. Borden, Apparatus and method for determining the active dopant profile in a semiconductor wafer ,(2001)
Stanley Wolf, Richard N. Tauber, Silicon Processing for the VLSI Era ,(1986)