Impact Evaporation and Thin Film Growth in a Glow Discharge

摘要: Publisher Summary This chapter describes in detail the impact evaporation, or cathode sputtering, process and discusses important parameters of this with respect to thin film nucleation growth a glow discharge environment. Most work published on films prepared by however, has been done environment, even though an accurate description conditions prevailing system is fraught additional complexities. The most recent Russian contribution comes from Veksler, who studied energy spectra “reflected” emitted positive ions obtained bombarding Mo Ta targets Cs + energies up 2200 ev. Thompson irradiated gold foil, whose grains had oriented rolling, proton beam such that penetrated foil emerging average 300 kev. states fair success growing many compounds, as oxides, sulfides, nitrides, hydrides, achieved semiempirical approach, without benefit more profound insight into reaction kinetics discharge.