Apparatus and method for delivering process gas to a substrate processing system
作者： Paul Comita , Arkadii Samoilov
DOI:
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摘要: A method and apparatus for delivering process fluids to a substrate processing system is described herein. In one embodiment, the fluid delivery may include first conduit coupling with flow controller controlling of through conduit; second third conduit. The be used deliver during semiconductor fabrication.
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