作者: J. Andrew Parr , Lawrence P. Garetto , Mark E. Wohlford , Gordon R. Arbuckle , W. Eugene Roberts
DOI: 10.1002/(SICI)1097-4636(199904)45:1<1::AID-JBM1>3.0.CO;2-D
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摘要: Osseointegrated implants have a large potential for diverse clinical applications, including support sutural expansion and facial prostheses. The objectives of this study were to evaluate: (1) the histomorphometric response thin cortical bone implant placement (2) whether loading surrounding these affects osseointegration as evaluated by histomorphometry. Eighteen New Zealand White rabbits had two titanium placed bilaterally in anterior surface their nasal bones. divided into an unloaded control group, one experimental group loaded at 1 Newton (N), another 3 N. Fluorescent labels used mark areas active formation. All euthanized after 12 weeks loading. Stereological point-hit line-intercept methods measure volume, direct bone–implant contact, new turnover rate implants. remained stable during period. A factorial ANOVA with repeated measures was compare variables. only significant difference among three groups higher volume lateral coronal far region (p < 0.05). Within all groups, 0.002), 0.001), percent 0.05) within mm compared 1–3 away. This may be due increased stress strain adjacent implant. indicates that there are no detrimental effects on when cortices anchors expansion. © 1999 John Wiley & Sons, Inc. J Biomed Mater Res, 45, 1–10, 1999.