Nanoimprint lithography: An old story in modern times? A review
作者： Helmut Schift
DOI: 10.1116/1.2890972
关键词:
摘要: Nanoimprint lithography (NIL) is a high throughput, high-resolution parallel patterning method in which a surface pattern of a stamp is replicated into a material by mechanical contact …
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lib4ri.ch 参考文章(181)
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