作者: K. Stiller , H.-O. Andrén
DOI: 10.1016/0167-2584(82)90005-6
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摘要: Abstract Faulty field evaporation sequences, creating artefact vacancies, were observed during field-ion microscopy of tungsten specimens which had previously been irradiated in situ with 180–230 keV Xe+ ions at 80 K. Such sequences for atoms {222} planes neighbours to 〈111〉 di-vacancies. The faulty gave rise a tri- or quadri-vacancy contrast instead the expected di-vacancy contrast. This effect can be explained by influence reduced atomic binding energy on probability evaporation.