Thermal decomposition of Zr1 − xAlxN thin films deposited by magnetron sputtering
作者： R. Sanjinés , C.S. Sandu , R. Lamni , F. Lévy
DOI: 10.1016/J.SURFCOAT.2005.11.113
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摘要: Abstract The thermal stability of the metastable fcc Zr 1 − x Al x N thin films has been investigated by heating samples in ultra high vacuum ( P − 7 Pa). For this purpose, two with chemical composition 0.65 0.35 and 0.57 0.43 were grown reactive magnetron sputtering. heated for duration 60 min between 400–850 °C steps 50 °C. structural evolution annealed using X-ray diffraction (XRD), transmission electron spectroscopy (TEM) atomic force microscopy (AFM). Results show that up to annealing temperature 600 pristine mechanical properties all are retained. At temperatures above °C, important modification result as deduced from shift XRD peaks towards low 2θ values indicating changes unit cell dimension. Structural modifications accompanied hardness enhancement. In at 850 analysis energy dispersive spectrometry evidenced Al-rich regions inhomogeneously distributed plane film. results discussed terms transformation structure a two-phase system composed Al-poor crystallized h-AlN via spinodal decomposition.
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