Flexible microprocessor-based evaporation controller

摘要: Electron beam evaporation sources require two power supplies, one each for the filament current and electron acceleration. To obtain a stable deposition rate, emission between target must remain constant. During film deposition, slight geometry changes in evaporator cause significant rate variations, making constant readjustment of necessary. While commercial solutions, analog feedback regulators are often used to perform this task, these controllers cannot easily be adapted home-built sources. The microcontrolled controller presented here is more flexible versatile than solutions. can modified work with different external supplies allows easy upgrade most existing setups. A serial-port computer interface completely integrates into automated laboratory environment.