High Potential Columnar Nanocrystalline AlN Films Deposited by RF Reactive Magnetron Sputtering
作者： Chengzhang Han , Da Chen , Yaozhong Zhang , Dong Xu , Yijian Liu
DOI: 10.1007/BF03353690
关键词:
摘要: Columnar nanocrystalline aluminum nitride (cnc-AlN) thin films with (002) orientation and uniform texture have been deposited successfully on large silicon wafers by RF reactive magnetron sputtering. At the optimum sputtering parameters, cnc-AlN show a c-axis preferred crystallite size of about 28 nm surface roughness (RMS) 1.29 nm. The were well transparent an optical band gap 4.8 eV, residual compressive stress defect density in film revealed Ramon spectroscopy. Moreover, piezoelectric performances executed effectively bulk acoustic resonator structure.
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