Process chamber gas flow apparatus, systems, and methods
作者： Chandrakant M. Sapkale , Penchala N. Kankanala , Jeffrey C. Hudgens , Nir Merry , Karuppasamy Muthukamtchi
DOI:
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摘要: Process chamber gas flow control apparatus having a tiltable valve are disclosed. The includes process adapted to contain substrate, an exit from the including seat, and configured tilt relative seat non-uniformities within chamber. Systems methods disclosed, as numerous other aspects.
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