作者: Feng Chen , Xue-Lin Wang , Ke-Ming Wang , Qing-Ming Lu , Bing Teng
DOI: 10.1016/S0169-4332(02)00155-1
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摘要: Abstract BiB3O6 and Nd:YVO4 planar waveguides were fabricated by MeV Si+ (with a dose of 1×1014 ions/cm2) Cu+ 1×1015 ions/cm2) ion implantation, respectively. Prism coupling method was used to observe the dark modes waveguides. Reflectivity calculation (RCM) applied simulate refractive index profiles in guiding layer. Obvious positive changes surface layer induced which confined region beneath for many microns be waveguide structures.