Ion-source neutralization with a hot-filament cathode-neutralizer
作者： James R. Kahn , Viacheslav V. Zhurin , Harold R. Kaufman
DOI:
关键词:
摘要: In accordance with one embodiment of the present invention, ion-beam apparatus takes form a gridless ion source hot-filament cathode-neutralizer, in which hot filament is heated current from cathode-neutralizer heater. The connected to negative terminal discharge supply for source. This connection substantially isolated ground (the potential surrounding vacuum chamber, usually at earth ground) and its measured relative ground. heater controlled by adjusting it so as maintain this narrow operating range. control can be manual or automatic.
google.ca参考文章(11)
Raymond S. Robinson, Harold R. Kaufman, Capacitively coupled radiofrequency plasma source ,(1992)
David Fleischer, Gerald Cooperstein, Shyke A. Goldstein, A. Robert Sohval, David R. Hearn, Plasma electron source for cold-cathode discharge device or the like ,(1984)
Paul D. Reader, Harold R. Kaufman, Electron-bombardment ion sources ,(1975)
James R. Kahn, Viacheslav V. Zhurin, Ion assisted deposition source ,(2000)
Michael A. Scobey, Low pressure reactive magnetron sputtering apparatus and method ,(1996)
Harold R. Kaufman, Raymond S. Robinson, Ion source design for industrial applications AIAA Journal. ,vol. 20, pp. 745- 760 ,(1982) , 10.2514/3.51131
Harold R. Kaufman, Raymond S. Robinson, Richard Ian Seddon, End‐Hall ion source Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 5, pp. 2081- 2084 ,(1987) , 10.1116/1.574924
Harold R. Kaufman, Raymond S. Robinson, Broad-beam electron source Journal of Vacuum Science and Technology. ,vol. 3, pp. 1774- 1778 ,(1985) , 10.1116/1.573377
Paul D. Reader, Harold R. Kaufman, Electron-bombardment ion source including alternating potential means for cyclically varying the focussing of ion beamlets ,(1974)
James R. Kahn, Viacheslav V. Zhurin, Kirk A. Thompson, Harold R. Kaufman, Ion-assisted magnetron deposition ,(2001)