Chemical concentration control device
作者： Tim Helmer , Richard Novak , Ismail Kaskkoush
DOI:
关键词:
摘要: A system (500) and method for ensuring constant concentration ratios in multi-fluid mixtures used wafer processing steps. In one aspect the invention is a supplying mixture to process tank (330) comprising: transporting first fluid through supply line (110) having means control mass flow rate of fluid; second (210) converging fluids form mixture; repetitively measuring levels with sensor (310); upon (310) detecting undesirable either or mixture, automatically adjusting at least achieve desired levels.
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