Integrated circuit device with a connector access region and method for making thereof

作者: Shih-Hung Chen

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摘要: An integrated circuit device and a method for making it are provided. The comprises plural conductive layers, dielectric layers first stopping layers. extending in direction. paralleled to the disposed an alternative arrangement. over make no contact with

参考文章(8)
Hong-Ji Lee, Hang-Ting Lue, Shih-Hung Chen, Chin-Cheng Yang, Multilayer Connection Structure and Making Method ,(2011)
Masaaki Higashitani, Peter Rabkin, 3D Non-Volatile Memory With Metal Silicide Interconnect ,(2014)
Hang-Ting Lue, Shih-Hung Chen, Chih-Chang Hsieh, Mask Design With Optically Isolated Via and Proximity Correction Features ,(2012)
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Ranjan Khurana, David Swindler, Justin B. Dorhout, Jianming Zhou, Methods of Forming Semiconductor Constructions ,(2012)