作者: M. Pranaitis , L. Jaraminė , V. Čyras , A. Selskis , A. Galdikas
DOI: 10.1063/1.4827838
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摘要: In this work, we present a nickel assisted electroless deposition and etching method for significant reduction of reflectivity silicon by creating two-scale structured surface. As the first step, nano-texturization process was applied on planar Si wafers in order to optimize process. Next, surface with chemically prepared pyramids produce hierarchical (micron/nano) structure. We found that structure shown very low about 2.2% weighted reflection over broad wavelength range from 300 1100 nm, which is related changes morphology.