High quality superconducting niobium films produced by an ultra-high vacuum cathodic arc
作者： A Cianchi , J Langner , S Tazzari , R Russo , L Catani
DOI: 10.1088/0953-2048/18/7/L01
关键词:
摘要: The vacuum arc is a well-known technique for producing coatings with enhanced adhesion and film density. Many cathodic deposition systems are actually in use industry research. They all work under (high) conditions which water vapour pressure an important source of contamination, especially the pulsed mode operation. Here we present system working ultra-high (UHVCA). UHVCA has been used to produce ultra-pure niobium films excellent structural electrical properties at temperature lower than 100 °C. therefore opens up new perspectives applications requiring pure low temperatures.
harvard.edu
sci-hub.st 参考文章(15)
André Anders, Atomic scale heating in cathodic arc plasma deposition Applied Physics Letters. ,vol. 80, pp. 1100- 1102 ,(2002) , 10.1063/1.1448390
André Anders, Energetics of vacuum arc cathode spots Applied Physics Letters. ,vol. 78, pp. 2837- 2839 ,(2001) , 10.1063/1.1370541
J. H. Claassen, M. E. Reeves, R. J. Soulen, A contactless method for measurement of the critical current density and critical temperature of superconducting films Review of Scientific Instruments. ,vol. 62, pp. 996- 1004 ,(1991) , 10.1063/1.1141991
PJ Martin, A Bendavid, Review of the filtered vacuum arc process and materials deposition Thin Solid Films. ,vol. 394, pp. 1- 14 ,(2001) , 10.1016/S0040-6090(01)01169-5
G. Heim, Eric Kay, Ion implantation during film growth and its effect on the superconducting properties of niobium Journal of Applied Physics. ,vol. 46, pp. 4006- 4012 ,(1975) , 10.1063/1.322154
André Anders, Approaches to rid cathodic arc plasmas of macro- and nanoparticles: a review Surface and Coatings Technology. ,vol. 120-121, pp. 319- 330 ,(1999) , 10.1016/S0257-8972(99)00460-0
David M Sanders, André Anders, Review of cathodic arc deposition technology at the start of the new millennium Surface & Coatings Technology. pp. 78- 90 ,(2000) , 10.1016/S0257-8972(00)00879-3
Jochen M. Schneider, André Anders, Björgvin Hjörvarsson, Lars Hultman, Magnetic-field-dependent plasma composition of a pulsed arc in a high-vacuum ambient Applied Physics Letters. ,vol. 76, pp. 1531- 1533 ,(2000) , 10.1063/1.126086
Karol Macák, Ulf Helmersson, Jan-Eric Sundgren, Jochen M. Schneider, André Anders, Björgvin Hjörvarsson, Ivan Petrov, Hydrogen uptake in alumina thin films synthesized from an aluminum plasma stream in an oxygen ambient Applied Physics Letters. ,vol. 74, pp. 200- 202 ,(1999) , 10.1063/1.123292
T. Witke, T. Schuelke, B. Schultrich, P. Siemroth, J. Vetter, Comparison of filtered high-current pulsed arc deposition (φ-HCA) with conventional vacuum arc methods Surface & Coatings Technology. ,vol. 126, pp. 81- 88 ,(2000) , 10.1016/S0257-8972(00)00544-2