作者: Timothy J. Minvielle , Robert J. Wilson , Robert L. White
DOI: 10.1063/1.115586
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摘要: A series of bilayers the form Cu(100)/[Co(21 A)/Cu(21 A)]n were grown by both ion beam and DC magnetron sputtering techniques. Scanning tunneling microscopy images developing layers demonstrate a marked difference in way which roughness evolves through films. The higher energy sputtered systems show nonconformal that is characterized comparatively large lateral length scales. less energetic magnetron‐formed exhibit an island‐upon‐island growth conformal from layer to layer. Kerr effect measurements former ferromagnetically coupled latter antiferromagnetically coupled. An explanation presented attributes differences potential barriers at step edges. Adatom mobility incident are shown be determining factors for this kind growth.