Structural and morphological studies of Co/SiO2 discontinuous multilayers
作者： D Thiaudière , O Proux , J.-S Micha , C Revenant , J.-R Regnard
DOI: 10.1016/S0921-4526(99)01902-X
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摘要: Abstract This work aims to study the structural properties of Co-SiO 2 discontinuous multilayers, obtained by magnetron sputtering. Such structure consisting equally spaced planes Co aggregates is embedded in a SiO matrix. According nanostructure, size metallic and mean distance between them, magnetic transport multilayers can be strongly modified. We used grazing incidence small angle X-ray scattering technique (GISAXS) for morphological characterisation some selected as function metal thickness annealing conditions after deposition. GISAXS measurements were carried out at ESRF on ID01 beamline. Below percolation threshold, we are able determine aggregate density this technique. The in-plane sample varies with nominal up 400°C seems have weak effect film characteristics.
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