Growth Kinetics of Thin Films Formed by Nucleation during Layer Formation
作者： VG Dubrovskii , GE Cirlin
DOI: 10.1134/1.2128448
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摘要: A kinetic model of thin-film growth on a solid surface is investigated. This valid in the case where layers are formed as result two-dimensional nucleation. Under conditions high supersaturation gaseous phase, solutions obtained for an island-size distribution function at initial stage growth, degree filling substrate by islands coalescence stage, vertical-growth rate film, and its roughness. These express structural characteristics growing film terms physical constants (the interphase energy gas-solid interface activation barriers diffusion desorption) system parameters temperature material-deposition rate). The results make it possible to calculate dynamics thin films particular systems.
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