Reconfigurable field effect transistor for advanced CMOS: Advantages and limitations

作者: C. Navarro , S. Barraud , S. Martinie , J. Lacord , M.-A. Jaud

DOI: 10.1016/J.SSE.2016.10.027

关键词:

摘要: … This configuration allows to in-situ switch from N to P-like FETs by selecting which carrier is injected by tunneling. The RFET main advantages are: (i) no doping required for S/D regions …

参考文章(27)
Jan M. Rabaey, Digital integrated circuits: a design perspective / Jan M. Rabaey, Anantha Chandrakasan, Borivoje Nikolic 1. SIRKUIT DIGITAL#R#<BR>2. SEMIKONDUKTOR,Digital integrated circuits: a design perspective / Jan M. Rabaey, Anantha Chandrakasan, Borivoje Nikolic. ,vol. 2003, pp. 1- 99 ,(2003)
Jens Trommer, Andre Heinzig, Tim Baldauf, Stefan Slesazeck, Thomas Mikolajick, Walter M. Weber, Functionality-Enhanced Logic Gate Design Enabled by Symmetrical Reconfigurable Silicon Nanowire Transistors IEEE Transactions on Nanotechnology. ,vol. 14, pp. 689- 698 ,(2015) , 10.1109/TNANO.2015.2429893
T.J. Drummond, Work Functions of the transition Metals and Metal Silicides Journal of Applied Physics. ,(1999)
Anthony Villalon, Cyrille Le Royer, Mikael Casse, David Cooper, Jean-Michel Hartmann, Fabienne Allain, Claude Tabone, Francois Andrieu, Sorin Cristoloveanu, Experimental Investigation of the Tunneling Injection Boosters for Enhanced $I_{ON}$ ETSOI Tunnel FET IEEE Transactions on Electron Devices. ,vol. 60, pp. 4079- 4084 ,(2013) , 10.1109/TED.2013.2287610
Michele De Marchi, Davide Sacchetto, Jian Zhang, Stefano Frache, Pierre-Emmanuel Gaillardon, Yusuf Leblebici, Giovanni De Micheli, Top–Down Fabrication of Gate-All-Around Vertically Stacked Silicon Nanowire FETs With Controllable Polarity IEEE Transactions on Nanotechnology. ,vol. 13, pp. 1029- 1038 ,(2014) , 10.1109/TNANO.2014.2363386
J. E. Rowe, S. B. Christman, G. Margaritondo, Metal-Induced Surface States during Schottky-Barrier Formation on Si, Ge, and GaAs Physical Review Letters. ,vol. 35, pp. 1471- 1475 ,(1975) , 10.1103/PHYSREVLETT.35.1471
Jens Trommer, Andre Heinzig, Stefan Slesazeck, Thomas Mikolajick, Walter Michael Weber, Elementary Aspects for Circuit Implementation of Reconfigurable Nanowire Transistors IEEE Electron Device Letters. ,vol. 35, pp. 141- 143 ,(2014) , 10.1109/LED.2013.2290555
Jian Zhang, Michele De Marchi, Davide Sacchetto, Pierre-Emmanuel Gaillardon, Yusuf Leblebici, Giovanni De Micheli, Polarity-Controllable Silicon Nanowire Transistors With Dual Threshold Voltages IEEE Transactions on Electron Devices. ,vol. 61, pp. 3654- 3660 ,(2014) , 10.1109/TED.2014.2359112
H. Iwai, Materials and structures for future nano CMOS nanotechnology materials and devices conference. pp. 14- 18 ,(2011) , 10.1109/NMDC.2011.6155304