Substrate processing apparatus including exhaust ports and substrate processing method

摘要: Provided is a substrate processing apparatus. The apparatus in which processes with respect to substrates are performed includes lower chamber having an opened upper side, the including passage allowing pass therethrough side thereof, external reaction tube closing of provide process space performed, holder on one or more vertically stacked, being movable between stacking position stacked within and at least supply nozzle disposed along inner wall tube, hole for discharging gas, exhaust suctioning non-reaction gas byproducts space, rear line connected discharge suctioned through hole. port connecting auxiliary defined line.