Apparatus for thermal treatment of thin film wafer
作者： Hyun-Su Kyung , Won-Song Choi , Jung-Ho Shin
DOI:
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摘要: An apparatus for thermal treatment of a wafer comprising vacuum chamber (10) with heater block (20) positioned in the and clamp means (31) which presses against on weight (31). A (60) forms gas supply (100) supplies into to provide uniform temperature. (50) heat treatment.
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