Temperature Dependence of Dielectric Constant of Nanoparticle Composite Porous Low-k Films Fabricated by Pulse Radio Frequency Discharge with Amplitude Modulation

摘要: Nanoparticle composite porous low-k films are deposited by pulse radio frequency (RF) discharge with the amplitude modulation (AM) of voltage. The deposition rate obtained AM is 0.65 nm/s, which sevenfold as high that without AM, and porosity = 60–63% dielectric constant k 1.1–1.4 for nearly equal to those AM. RF a promising method increasing less pronounced agglomeration variations in properties films. With decreasing substrate temperature from 403 368 K, increases 3.5 60%, leading reduction their 2.9 1.4. Substrate key parameter determines